We provide high-performance RF generators, matching units, DC power supplies, and pulse DC power supplies to meet various deposition process needs such as CVD and PVD.

Etching is a key step in semiconductor manufacturing and requires extremely high plasma control precision. Our unique innovative technology can provide reliable power sources for advanced processes.

As chip designs become increasingly complex, the requirements for precise control of ion implantation are also getting higher. Our power supply products ensure precise control of ion implantation energy with their high power density and high precision.

With the development of advanced semiconductor processes, interconnect process power supplies face challenges and need to feature ultra-low ripple, high-precision output, and fast dynamic response to ensure process stability and yield.

The photoresist stripping step is used to remove residual photoresist to avoid affecting the accuracy of subsequent etching, deposition, or ion implantation. Precise power control is crucial in this process.